Služby / Hodnotenie štruktúry materiálov /
Chemická analýza zloženia vrátane analýzy obsahu plynov
Optická emisná spektroskopia
General purpose
The optical emission spectroscopy (OES) using arc and spark excitation is preferred method to determine the chemical composition of metallic materials.The technique is considered to be "non-destructive"; that is, spark discharge do not lead to volume loss of the sample, so it is possible to analyse the same materials repeatedly.
Principle of operation
Sample material isevaporated by arc discharge or spark to sparkgaps. Part of the material is evaporated by spark discharge below specimen surface. In this process, the released atoms and ions are excited and emitthe light of the certain wavelength. This light is directed into the optical systems and measured using light-sensitive electronic detector which converts light into electric signal. The measured signal is subsequently converted into concentrations, which reveal information about the sample chemical composition.
Application of the technique
Rapid analysis time and inherent accuracy, arc spark optical emission spectroscopy systems are most effective in controlling the processing of alloys:
- inspection of materials
- metal processing
- quality control of semi-finished and final products
- chemical composition of the metallic material is required.
This method allows to measure a wide range of materials for example: aluminium, cobalt, cooper, iron, magnesium, nickel, lead, tin, titanium and zinc.
Zariadenia
Kontakt
Miroslav Čavojský
X-ray fluorescence spectroscopy
General purpose
The energy dispersive X-ray fluorescent technology (ED-XRF) enables one of the easiest, most accurate and high economic analytical methods for determining the chemical composition of many types of materials. The method is non-destructive and reliable; it requires no or very little sample preparation and is suitable for solid, liquid and bulk samples. The technique is suitable for a wide range of elements from sodium (11 Na) to uranium (U 92) and works with limits of detection at sub-ppm.
Principle of operation
After interaction of electromagnetic radiation and sample surface, X-rays are excited from the atoms of the sample and emits radiation. This radiation is measured by a semiconductor detector. To achieve a higher sensitivity, the exciting radiation can be optimized by using targets. The ED-XRFdevice is usually equipped with an installed analysis method and datasets are already stored in the unit's memory. Subsequently, the measured values are compared with stored data. After the measurement is completed, the results relating to an unknown sample are displayed on the screen and chemical composition is estimated.
Application of the technique
By ED-XRF is possible to determine the chemical composition of Al, Fe, Mg and other chemical components based alloys, for example construction materials, high temperature materials, biodegradable materials,etc.
Zariadenia
Kontakt
Miroslav Čavojský